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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock

Categories Tungsten Plate
Brand Name: PRM
Model Number: custom
Certification: ISO9001
Place of Origin: China
MOQ: 1kg
Price: $80~200/kg
Payment Terms: T/T
Supply Ability: 2000kgs/month
Delivery Time: 7~10 work days
Packaging Details: Plywood case
Name: Tungsten Sputtering Target For Magnetron Sputtering Coating
Material: Pure Tungsten
Purity: 99.95%
Density: 19.3 g/cm3
Shape: Round Target
Thickness: <20mm
Diameter: 25~300mm
Surface: Polished
Standard: ASTM B760
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock

Tungsten Sputtering Target For Magnetron Sputtering Coating


1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating:


The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets are also used in the microelectronics industry, for example to form coatings in frequency filters (surface acoustic wave filters (SAW), bulk acoustic wave filters (BAW)). Other applications for tungsten targets include diffusion barriers made of tungsten nitride, conductor tracks in microelectronic components, and reactive sputtered transparent layers made of tungsten oxide for OLED displays and electrochemical applications.


In the magnetron sputtering process (PVD process), the sputtering target releases tiny metal particles that deposit on the material to be coated (ie the substrate), forming a thin film. This coating process is economical and fast, in which all materials must meet the strictest quality standards.


2. Size And Tolerance Of Tungsten Sputtering Target For Magnetron Sputtering Coating:


Item NameTungsten Sputtering Target For Magnetron Sputtering Coating
Purity99.95%
ShapeFlat/rotary target, according to your request
Available size

Round: dia 25~300mm, Thickness:<20mm

Rectangular: Length up to 1500mm

Customization is available

CertificatesISO9001:2008, SGS, The third test report
TechnicsHot isostatic pressing
Application

Widely used in coating processing industries

A: Electronic and Semiconductor Application.

B: Decoration and Coating Application. etc.

Other size can be processed according to customer's drawing.

Tungsten Sputtering target is produced with a standard anneal

Width Tolerance: +/-1/32”

Length Tolerance: +1/16”, -0”

Surface Finishes: Polished

Standard: ASTM B760



3. Chemical composition Of Tungsten Sputtering Target For Magnetron Sputtering Coating:


Quality Standard (99.95% W)
ElementValue (<ppm)ElementValue (<ppm)
Fe5Mo10
Ni3P1
Al2C5
Si3O3
Ca3N3
Mg2

4. Application Of Tungsten Sputtering Target For Magnetron Sputtering Coating:

Tungsten sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic control devices, etc.; they can also be used in the field of glass coating; they can also be used in wear-resistant materials, high temperature resistance Corrosion, high-end decorative products and other industries.



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